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Quartz Sheets for Semiconductor Etching Chamber-Eva

พิมพ์ในวันที่: October 26, 2026

Quartz Sheets for Semiconductor Etching Chamber

 

A semiconductor equipment manufacturer from South Korea contacted us for custom quartz sheets used as observation windows inside plasma etching chambers. Their old supplier’s quartz parts had occasional metal impurity release and particle generation, leading to rising wafer defect rates in production.

 

During multiple technical conferences, the client’s process engineers clarified strict semiconductor-grade standards: SiO₂ purity ≥99.999%, low hydroxyl content, ultra-low heavy metal contamination, double-sided fine polishing and flatness controlled within 0.01 mm. They also required documentation including cleaning reports, particle inspection records and batch traceability certificates. Our team confirmed every specification step by step and arranged cleanroom processed samples.

 

The client carried out plasma bombardment simulation and high-temperature aging tests in their quality lab. Test feedback showed our quartz sheets generated far fewer particles under fluorine-based plasma, without warping after long cycles of heating and cooling. They signed off on the material grade, inspection procedure and packaging requirements before placing the pilot order.

 

Once installed on etching equipment, the quartz windows maintained stable dimension and optical performance. The fab’s wafer yield improved noticeably, and component replacement frequency dropped. The client praised our consistent batch quality and transparent testing records, which fit their strict semiconductor quality management system.

 

Later, they signed a long-term framework agreement for quarterly supply. This cooperation demonstrates that high-purity, precision-processed quartz sheets directly reduce contamination risk and support stable chip manufacturing, a key advantage over standard industrial quartz.